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  • Micro sensor for determination of thin layerthickness and refractive index

    Martin Schädel, Dennis Mitrenga, Philip Schmitt, Andreas T. Winzer, Olaf Brodersen

    Kapitel/Beitrag aus dem Buch: Längle, T et al. 2015. OCM 2015 – 2nd International Conference on Optical Characterization of Materials, March 18th – 19th, 2015, Karlsruhe, Germany : Conference Proceedings.

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    We present a microoptical sensor solution for measuring
    thicknesses and refractive indices of thin layers by measuring
    changes in polarization of two laser beams under inclined angle
    of incidence. The compact architecture does not require any
    moving or rotating components and allows for low-maintenance
    and robust operation. The measured polarized reflection is modelled
    by Transfer Matrix method and Levenberg-Marquard fit algorithms
    in order to obtain the target sample characteristics. Single
    layer samples of SiO2, SiOxNy and SiNx on Silicon substrate
    were analyzed. For several different single layer systems the deviations
    of layer thicknesses and refractive indices are below 3%
    as compared to independent reference measurements.

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    Empfohlene Zitierweise für das Kapitel/den Beitrag
    Schädel, M et al. 2015. Micro sensor for determination of thin layerthickness and refractive index. In: Längle, T et al (eds.), OCM 2015 – 2nd International Conference on Optical Characterization of Materials, March 18th – 19th, 2015, Karlsruhe, Germany : Conference Proceedings. Karlsruhe: KIT Scientific Publishing. DOI: https://doi.org/10.58895/ksp/1000044906-20
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    Veröffentlicht am 18. März 2015

    DOI
    https://doi.org/10.58895/ksp/1000044906-20